Ultra-Precision 20mm Metered Valve for Semiconductor Manufacturing with Cleanroom Compatibility
Product Description:
Achieve micron-level accuracy in semiconductor fabrication with our ultra-precision 20mm metered valve, engineered for cleanroom environments. This high-purity dosing valve features a ultra-smooth ceramic core and a particle-resistant coating, ensuring contamination-free fluid transfer. Designed for process engineers and cleanroom technicians, it dispenses photoresists, etchants, and dopants with sub-micron precision, critical for wafer fabrication. The metered valve system includes a real-time流量 monitoring sensor, providing data for SPC (Statistical Process Control) systems. With a ultra-low dead volume design, it minimizes fluid waste and maximizes material efficiency. The non-magnetic construction prevents interference with sensitive semiconductor equipment, making it ideal for advanced lithography and deposition processes.
Bullet Points:
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Ultra-Smooth Ceramic Core: Prevents particle generation during fluid transfer.
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Particle-Resistant Coating: Maintains fluid purity in ISO Class 1 cleanrooms.
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Real-Time Flow Monitoring: Integrates with factory SPC systems for quality tracking.
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Ultra-Low Dead Volume Design: Reduces chemical waste by up to 40%.
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Non-Magnetic Construction: Safe for use near sensitive semiconductor machinery.
FAQ:
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Q: Can the 20mm metered valve operate in ISO Class 1 cleanrooms?
A: Yes, its particle-resistant coating and ceramic core meet cleanroom standards.
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Q: How does the dosing valve ensure ultra-precision in semiconductor applications?
A: The ceramic core and real-time sensors enable sub-micron dispensing accuracy.
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Q: Is the metered valve compatible with photoresist chemicals?
A: Yes, it is chemically resistant to common photoresists and etchants.
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Q: Does the valve interfere with magnetic equipment in fabs?
A: No, its non-magnetic design prevents interference with sensitive instruments.
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Q: How does the ultra-low dead volume benefit semiconductor manufacturing?
A: It reduces chemical waste and ensures consistent coating thickness on wafers.
